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Other articles related with "atomic layer deposition"：
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80702 |
Shangkun Shao(邵尚坤), Huiquan Li(李惠泉), Tianyu Yuan(袁天语), Xuepeng Sun(孙学鹏), Lu Hua(华路), Zhiguo Liu(刘志国), and Tianxi Sun(孙天希) |
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Glancing incidence x-ray fluorescence spectrometry based on a single-bounce parabolic capillary |
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Chin. Phys. B
2023 Vol.32 (8): 80702-080702
[Abstract]
(131)
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[PDF 1060 KB]
(9)
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97401 |
Cheng-Yu Huang(黄成玉), Jin-Yan Wang(王金延), Bin Zhang(张斌), Zhen Fu(付振), Fang Liu(刘芳), Mao-Jun Wang(王茂俊), Meng-Jun Li(李梦军), Xin Wang(王鑫), Chen Wang(汪晨), Jia-Yin He(何佳音), and Yan-Dong He(何燕冬) |
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Physical analysis of normally-off ALD Al2O3/GaN MOSFET with different substrates using self-terminating thermal oxidation-assisted wet etching technique |
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Chin. Phys. B
2022 Vol.31 (9): 97401-097401
[Abstract]
(317)
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[PDF 1088 KB]
(87)
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57701 |
Ze Feng(冯泽), Yitong Wang(王一同), Jilong Hao(郝继龙), Meiyi Jing(井美艺), Feng Lu(卢峰), Weihua Wang(王维华), Yahui Cheng(程雅慧), Shengkai Wang(王盛凯), Hui Liu(刘晖), and Hong Dong(董红) |
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Designing high k dielectric films with LiPON—Al2O3 hybrid structure by atomic layer deposition |
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Chin. Phys. B
2022 Vol.31 (5): 57701-057701
[Abstract]
(311)
[HTML 1 KB]
[PDF 1359 KB]
(58)
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17803 |
Xiao-Bo He(何小波), Hua-Tian Hu(胡华天), Ji-Bo Tang(唐继博), Guo-Zhen Zhang(张国桢), Xue Chen(陈雪), Jun-Jun Shi(石俊俊), Zhen-Wei Ou(欧振伟), Zhi-Feng Shi(史志锋), Shun-Ping Zhang(张顺平), Chang Liu(刘昌), and Hong-Xing Xu(徐红星) |
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Uniform light emission from electrically driven plasmonic grating using multilayer tunneling barriers |
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Chin. Phys. B
2022 Vol.31 (1): 17803-017803
[Abstract]
(414)
[HTML 1 KB]
[PDF 1273 KB]
(86)
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50703 |
Yan-Li Li(李艳丽), Ya-Bing Wang(王亚冰), Wei-Er Lu(卢维尔), Xiang-Dong Kong(孔祥东), Li Han(韩立), and Hui-Bin Zhao(赵慧斌) |
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Characterization and application in XRF of HfO2-coated glass monocapillary based on atomic layer deposition |
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Chin. Phys. B
2021 Vol.30 (5): 50703-050703
[Abstract]
(351)
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[PDF 981 KB]
(252)
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117701 |
Ji-Bin Fan(樊继斌), Shan-Ya Ling(凌山雅), Hong-Xia Liu(刘红侠), Li Duan(段理), Yan Zhang(张研), Ting-Ting Guo(郭婷婷), Xing Wei(魏星), and Qing He(何清)$ |
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Surface termination effects on the electrical characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition |
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Chin. Phys. B
2020 Vol.29 (11): 117701-
[Abstract]
(436)
[HTML 1 KB]
[PDF 770 KB]
(75)
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107102 |
Bingheng Meng(孟兵恒), Dengkui Wang(王登魁)†, Deshuang Guo(郭德双), Juncheng Liu(刘俊成), Xuan Fang(方铉), Jilong Tang(唐吉龙), Fengyuan Lin(林逢源), Xinwei Wang(王新伟), Dan Fang(房丹), and Zhipeng Wei(魏志鹏)‡ |
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Effect of source temperature on phase and metal–insulator transition temperature of vanadium oxide films grown by atomic layer deposition |
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Chin. Phys. B
2020 Vol.29 (10): 107102-
[Abstract]
(381)
[HTML 1 KB]
[PDF 879 KB]
(77)
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38102 |
Ailing Chang(常爱玲), Yichen Mao(毛亦琛), Zhiwei Huang(黄志伟), Haiyang Hong(洪海洋), Jianfang Xu(徐剑芳), Wei Huang(黄巍), Songyan Chen(陈松岩), Cheng Li(李成) |
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Low-temperature plasma enhanced atomic layer deposition of large area HfS2 nanocrystal thin films |
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Chin. Phys. B
2020 Vol.29 (3): 38102-038102
[Abstract]
(612)
[HTML 1 KB]
[PDF 996 KB]
(112)
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98103 |
Cai-Xia Hou(侯彩霞), Xin-He Zheng(郑新和), Rui Jia(贾锐), Ke Tao(陶科), San-Jie Liu(刘三姐), Shuai Jiang(姜帅), Peng-Fei Zhang(张鹏飞), Heng-Chao Sun(孙恒超), Yong-Tao Li(李永涛) |
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Crystalline silicon surface passivation investigated by thermal atomic-layer-deposited aluminum oxide |
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Chin. Phys. B
2017 Vol.26 (9): 98103-098103
[Abstract]
(772)
[HTML 0 KB]
[PDF 983 KB]
(432)
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67701 |
Ji-Bin Fan(樊继斌), Hong-Xia Liu(刘红侠), Li Duan(段理), Yan Zhang(张研), Xiao-Chen Yu(于晓晨) |
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Influences of different oxidants on characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition |
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Chin. Phys. B
2017 Vol.26 (6): 67701-067701
[Abstract]
(826)
[HTML 1 KB]
[PDF 625 KB]
(303)
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57702 |
Ji-Bin Fan(樊继斌), Hong-Xia Liu(刘红侠), Bin Sun(孙斌), Li Duan(段理), Xiao-Chen Yu(于晓晨) |
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Performance and reliability improvement of La2O3/Al2O3 nanolaminates using ultraviolet ozone post treatment |
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Chin. Phys. B
2017 Vol.26 (5): 57702-057702
[Abstract]
(768)
[HTML 1 KB]
[PDF 1315 KB]
(284)
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128104 |
Li-Xin Tian(田丽欣), Feng Zhang(张峰), Zhan-Wei Shen(申占伟), Guo-Guo Yan(闫果果), Xing-Fang Liu(刘兴昉), Wan-Shun Zhao(赵万顺), Lei Wang(王雷), Guo-Sheng Sun(孙国胜), Yi-Ping Zeng(曾一平) |
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Influences of annealing on structural and compositional properties of Al2O3 thin films grown on 4H-SiC by atomic layer deposition |
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Chin. Phys. B
2016 Vol.25 (12): 128104-128104
[Abstract]
(547)
[HTML 1 KB]
[PDF 1230 KB]
(449)
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108101 |
Li-Fan Wu(武利翻), Yu-Ming Zhang(张玉明), Hong-Liang Lv(吕红亮), Yi-Men Zhang(张义门) |
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Atomic-layer-deposited Al2O3 and HfO2 on InAlAs: A comparative study of interfacial and electrical characteristics |
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Chin. Phys. B
2016 Vol.25 (10): 108101-108101
[Abstract]
(585)
[HTML 1 KB]
[PDF 364 KB]
(317)
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58106 |
Chen-Xi Fei(费晨曦), Hong-Xia Liu(刘红侠), Xing Wang(汪星), Dong-Dong Zhao(赵冬冬), Shu-Long Wang(王树龙), Shu-Peng Chen(陈树鹏) |
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Influences of different structures on the characteristics of H2O-based and O3-based LaxAlyO films deposited by atomic layer deposition |
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Chin. Phys. B
2016 Vol.25 (5): 58106-058106
[Abstract]
(659)
[HTML 1 KB]
[PDF 385 KB]
(381)
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37308 |
Jinjuan Xiang(项金娟), Yuqiang Ding(丁玉强), Liyong Du(杜立永), Junfeng Li(李俊峰),Wenwu Wang(王文武), Chao Zhao(赵超) |
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Growth mechanism of atomic-layer-deposited TiAlC metal gatebased on TiCl4 and TMA precursors |
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Chin. Phys. B
2016 Vol.25 (3): 37308-037308
[Abstract]
(795)
[HTML 0 KB]
[PDF 1486 KB]
(975)
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27301 |
Qiu Hong-Bo (仇洪波), Li Hui-Qi (李惠琪), Liu Bang-Wu (刘邦武), Zhang Xiang (张祥), Shen Ze-Nan (沈泽南) |
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AlOx prepared by atomic layer deposition for high efficiency-type crystalline silicon solar cell |
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Chin. Phys. B
2014 Vol.23 (2): 27301-027301
[Abstract]
(492)
[HTML 1 KB]
[PDF 321 KB]
(1034)
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127303 |
Zhang Xiang (张祥), Liu Bang-Wu (刘邦武), Zhao Yan (赵彦), Li Chao-Bo (李超波), Xia Yang (夏洋) |
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Influence of annealing temperature on passivation performance of thermal atomic layer deposition Al2O3 films |
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Chin. Phys. B
2013 Vol.22 (12): 127303-127303
[Abstract]
(590)
[HTML 1 KB]
[PDF 1326 KB]
(1056)
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97701 |
Tang Zhen-Jie (汤振杰), Li Rong (李荣), Yin Jiang (殷江) |
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Performance improvement of charge trap flash memory by using a composition-modulated high-k trapping layer |
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Chin. Phys. B
2013 Vol.22 (9): 97701-097701
[Abstract]
(782)
[HTML 1 KB]
[PDF 379 KB]
(513)
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67702 |
Tang Zhen-Jie (汤振杰), Li Rong (李荣), Yin Jiang (殷江) |
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The charge storage characteristics of ZrO2 nanocrystallite-based charge trap nonvolatile memory |
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Chin. Phys. B
2013 Vol.22 (6): 67702-067702
[Abstract]
(694)
[HTML 1 KB]
[PDF 578 KB]
(491)
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27702 |
Fan Ji-Bin (樊继斌), Liu Hong-Xia (刘红侠), Ma Fei (马飞), Zhuo Qing-Qing (卓青青), Hao Yue (郝跃) |
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Influences of different oxidants on the characteristics of HfAlOx films deposited by atomic layer deposition |
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Chin. Phys. B
2013 Vol.22 (2): 27702-027702
[Abstract]
(734)
[HTML 1 KB]
[PDF 328 KB]
(983)
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78105 |
Xiong Yu-Qing(熊玉卿), Li Xing-Cun(李兴存), Chen Qiang(陈强), Lei Wen-Wen(雷雯雯), Zhao Qiao(赵桥), Sang Li-Jun(桑利军), Liu Zhong-Wei(刘忠伟), Wang Zheng-Duo(王正铎), and Yang Li-Zhen(杨丽珍) |
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Characteristics and properties of metal aluminum thin film prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology |
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Chin. Phys. B
2012 Vol.21 (7): 78105-078105
[Abstract]
(1393)
[HTML 1 KB]
[PDF 3826 KB]
(3353)
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3014 |
Feng Qian(冯倩), Tian Yuan(田园), Bi Zhi-Wei(毕志伟), Yue Yuan-Zheng(岳远征), Ni Jin-Yu(倪金玉), Zhang Jin-Cheng(张进成), Hao Yue(郝跃), and Yang Lin-An(杨林安) |
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The improvement of Al2O3/AlGaN/GaN MISHEMT performance by N2 plasma pretreatment |
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Chin. Phys. B
2009 Vol.18 (7): 3014-3017
[Abstract]
(1511)
[HTML 1 KB]
[PDF 714 KB]
(986)
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